| Title | : | Atomic Layer Deposition |
|---|---|---|
| Author | : | Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen & Arthur Sherman |
| Release | : | 2013-05-17 |
| Kind | : | ebook |
| Genre | : | Engineering, Books, Professional & Technical |
| Size | : | 8553295 |
| Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials. |
